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equipment:edwards-306:log [2026/05/17 10:58] – [Day 2026-05-15 (q3k, implr, leah, rahix)] add more data rahixequipment:edwards-306:log [2026/06/27 20:27] (current) – [Day 2026-06-27 (rahix)] rahix
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 ===== Journal for the Edwards AUTO 306 Coating Systems ===== ===== Journal for the Edwards AUTO 306 Coating Systems =====
 This is the journal.  See the [[equipment:edwards-306:start|Edwards AUTO 306 Coating System]] project page for an overview. This is the journal.  See the [[equipment:edwards-306:start|Edwards AUTO 306 Coating System]] project page for an overview.
 +
 +==== Day 2026-06-27 (rahix) ====
 +Both coaters now have their own ~3ph outlet (on the same 16A circuit). Installed secondary 4mm² PE connection for the sputter coater.
 +Checked R<sub>LOW</sub> and R<sub>ISO</sub> for both coaters.
 +
 +==== Day 2026-06-12 (q3k, hugo, rahix) ====
 +On the sputter coater, installed 3 new cooling circuit flow sensors to detect problems with the water cooling loops.
 +
 +{{:equipment:edwards-306:20260612-interlock-flow-sensors.jpg?400|}}
 +
 +New interlock cable from those sensors to the control rack made from repurposed CAT6:
 +
 +  * **Orange:** Turbo Interlock (Main)
 +  * **Green:** DC Interlock
 +  * **Brown:** RF Interlock
 +
 +Tested system, no water leaks and interlocks work.
 +
 +The argon supply is still leaking close to the gas bottle.  Will need to fix that soon.
 +
 +Placed the two cheap environment sensors into the controls enclosures of the two coating systems. We did not rename them yet, so the mapping is "Unusually Large Staircase" -> Sputter Coater and "Chillzone" -> Evap Coater.
 +==== Day 2026-06-07 (q3k, guests) ====
 +//To be documented//
 +
 +==== Day 2026-06-05 (q3k, guests) ====
 +Hair sputtered with Cr, looks like way too much, 3mins at 400W:
 +
 +{{:equipment:edwards-306:20260605-hair1.png?400|}}
 +
 +Hair sputtered with Cr, 3min at 100W:
 +
 +{{:equipment:edwards-306:20260605-hair3.tif.png?400|}}
 +{{:equipment:edwards-306:20260605-hair4.tif.png?400|}}
 +==== Day 2026-05-2x,31 (q3k, hugo, ln, zoé, guests) ====
 +
 +Two days of work on the sputter coater.
 +
 +Ar cylinder connected via needle nose valve (inlet rerouted from MFC input line into dedicated input due to lack of plumbing fittings).
 +
 +RF matchbox ok, but high reflected power (4W at 100W out, 25+W at 200W out).
 +
 +Roughing pump seems very hot, but that might be atmospheric pressure.
 +
 +Turbo start sometimes fails and needs to be reset on the turbo controller. Roughing times out, needs set point changed.
 +
 +Some attempts at sputtering Al with Ar work, some don't. Very inconsistent. Most attempts done at plasma strike pressure, ~2.2*10^-2 mbar.
 +
 +Turns out RF sputter head isn't being cooled well - that might be the cause. We should dismantle it and check for damage (esp. magnets), and also try to cool it with the water chiller attached directly.
 +
 +{{:equipment:edwards-306:202605-sputter-plasma.jpg?400|}}
  
 ==== Day 2026-05-16 (q3k, implr, hugo) ==== ==== Day 2026-05-16 (q3k, implr, hugo) ====
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 The cooling capacity from the chiller is a bit on the low side, especially when evaporating Al. It seems beneficial to go 'fast and hard' and let the system accumulate heat just for a short period of time rather than slowly depositing very little material but causing the temperature of the cooling water to increase past 35 degrees. The cooling capacity from the chiller is a bit on the low side, especially when evaporating Al. It seems beneficial to go 'fast and hard' and let the system accumulate heat just for a short period of time rather than slowly depositing very little material but causing the temperature of the cooling water to increase past 35 degrees.
  
 +A few images of the 100nm Al on Si under the SEM:
 +
 +{{:equipment:edwards-306:al100nm3.tif.png?400|}}
 +{{:equipment:edwards-306:al100nm2.tif.png?400|}}
 +{{:equipment:edwards-306:al100nm.tif.png?400|}}
 ==== Day 2026-05-15 (q3k, implr, leah, rahix) ==== ==== Day 2026-05-15 (q3k, implr, leah, rahix) ====
  
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 A separate socket on the same 16A circuit will follow for the sputter coater. This means you shouldn't run them both at the same time. A separate socket on the same 16A circuit will follow for the sputter coater. This means you shouldn't run them both at the same time.
  
-Measured current of the evaporator without e-beam connected:+Measured current consumption of the evaporator without e-beam connected:
  
 ^System State  ^  Current^ ^System State  ^  Current^
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 |vacuum  |  3.3 A| |vacuum  |  3.3 A|
 |plasma  |  4.4 A| |plasma  |  4.4 A|
-|evaporation setting 8  |  6.5 A|+|**evaporation setting 8**  |  **6.5 A**|
 |vent  |  3.3 A| |vent  |  3.3 A|
 |vacuum after vent, roughing  |  4.0 A| |vacuum after vent, roughing  |  4.0 A|